Materials Science of Thin Films

Deposition and Structure
Author: Milton Ohring
Publisher: Academic Press
ISBN: 0125249756
Category: Science
Page: 794
View: 9751
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This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field. Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.

Materials Science of Thin Films

Deposition and Structure
Author: Milton Ohring,Shefford P. Baker
Publisher: Academic Press
ISBN: 9780128498934
Category: Science
Page: 864
View: 3043
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Materials Science of Thin Films: Deposition and Structure, Third Edition, carries on the tradition of this intriguing series, offering the most comprehensive coverage of materials science and technology related to thin films and coatings of any book in the field. The authors' engaging style brings new coverage to a variety of important topics within the field, including the latest, and most important, deposition techniques, atomic layer deposition and high impulse magnetron sputtering, and new, or expanded, coverage of recent developments in thin films technology, such as filtered cathodic arcs, nanorod growth by the vapor-liquid-solid process, carbon nanotubes, new quantitative kinetic nucleation models, atomic-level growth classifications, bi-textured layers, surface morphological evolution models, and competitive grain growth. Provides the most comprehensive coverage of materials science and technology related to thin films and coatings of any book in the field Updated to include coverage of the latest and most important deposition techniques, including atomic layer deposition and high impulse magnetron sputtering Includes new or expanded coverage of recent developments in thin films technology, such as filtered cathodic arcs, nanorod growth by the vapor-liquid-solid process, carbon nanotubes, new quantitative kinetic nucleation models, atomic-level growth classifications, and more Carries on the tradition of this intriguing series, offering the latest information on the subject matter

Engineering Materials Science


Author: Milton Ohring
Publisher: Elsevier
ISBN: 9780080505695
Category: Technology & Engineering
Page: 827
View: 7771
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Milton Ohring's Engineering Materials Science integrates the scientific nature and modern applications of all classes of engineering materials. This comprehensive, introductory textbook will provide undergraduate engineering students with the fundamental background needed to understand the science of structure-property relationships, as well as address the engineering concerns of materials selection in design, processing materials into useful products, andhow material degrade and fail in service. Specific topics include: physical and electronic structure; thermodynamics and kinetics; processing; mechanical, electrical, magnetic, and optical properties; degradation; and failure and reliability. The book offers superior coverage of electrical, optical, and magnetic materials than competing text. The author has taught introductory courses in material science and engineering both in academia and industry (AT&T Bell Laboratories) and has also written the well-received book, The Material Science of Thin Films (Academic Press). Key Features * Provides a modern treatment of materials exposing the interrelated themes of structure, properties, processing, and performance * Includes an interactive, computationally oriented, computer disk containing nine modules dealing with structure, phase diagrams, diffusion, and mechanical and electronic properties * Fundamentals are stressed * Of particular interest to students, researchers, and professionals in the field of electronic engineering

Thin Film Growth

Physics, Materials Science and Applications
Author: Zexian Cao
Publisher: Elsevier
ISBN: 0857093290
Category: Technology & Engineering
Page: 432
View: 1866
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Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films. Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field modelling of thin film growth and surface roughness evolution. Part two covers some of the techniques used for thin film growth, including oblique angle deposition, reactive magnetron sputtering and epitaxial growth of graphene films on single crystal metal surfaces. This section also includes chapters on the properties of thin films, covering topics such as substrate plasticity and buckling of thin films, polarity control, nanostructure growth dynamics and network behaviour in thin films. With its distinguished editor and international team of contributors, Thin film growth is an essential reference for engineers in electronics, energy materials and mechanical engineering, as well as those with an academic research interest in the topic. Provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films Focusses on the theory and modelling of thin film growth, techniques and mechanisms used for thin film growth and properties of thin films An essential reference for engineers in electronics, energy materials and mechanical engineering

Thin Film Analysis by X-Ray Scattering


Author: Mario Birkholz
Publisher: John Wiley & Sons
ISBN: 3527607048
Category: Technology & Engineering
Page: 378
View: 3196
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With contributions by Paul F. Fewster and Christoph Genzel While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications. Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.

Science and Technology of Electroceramic Thin Films


Author: O. Auciello,Rainer Waser
Publisher: Springer Science & Business Media
ISBN: 9780792333326
Category: Technology & Engineering
Page: 456
View: 7488
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Electroceramic thin films hold out the promise of applications in entirely new generations of advanced microdevices that may revolutionise technology, creating multibillion dollar markets in the process. Less glamorous than the high-temperature superconductors, but probably just as important, are electrically conductive, ferroelectric, piezoelectric, pyroelectric, electro-optic, and magnetic films. The list of potential applications of films having these properties is virtually endless, but there are still some issues to be resolved before fully functioning devices reach the market. All these issues and more are discussed in Science and Technology of Electroceramic Thin Films, which provides one of the best, most up to date summaries of the field currently available.

Thin Film Materials

Stress, Defect Formation and Surface Evolution
Author: L. B. Freund,S. Suresh
Publisher: Cambridge University Press
ISBN: 9781139449823
Category: Technology & Engineering
Page: 750
View: 7632
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Thin film mechanical behavior and stress presents a technological challenge for materials scientists, physicists and engineers. This book provides a comprehensive coverage of the major issues and topics dealing with stress, defect formation, surface evolution and allied effects in thin film materials. Physical phenomena are examined from the continuum down to the sub-microscopic length scales, with the connections between the structure of the material and its behavior described. Theoretical concepts are underpinned by discussions on experimental methodology and observations. Fundamental scientific concepts are embedded through sample calculations, a broad range of case studies with practical applications, thorough referencing, and end of chapter problems. With solutions to problems available on-line, this book will be essential for graduate courses on thin films and the classic reference for researchers in the field.

Materials Science in Microelectronics I

The Relationships Between Thin Film Processing and Structure
Author: Eugene Machlin
Publisher: Elsevier
ISBN: 9780080459608
Category: Technology & Engineering
Page: 270
View: 7928
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Thin films play a key role in the material science of microelectronics, and the subject matter of thin-films divides naturally into two headings: processing / structure relationship, and structure / properties relationship. The first volume of Materials Science in Microelectronics focuses on the first relationship – that between processing and the structure of the thin-film. The state of the thin film’s surface during the period that one monolayer exists - before being buried in the next layer – determines the ultimate structure of the thin film, and thus its properties. This volume takes into consideration the following potential influencing factors: crystal defects, void structure, grain structure, interface structure in epitaxial films, the structure of amorphous films, and reaction-induced structure. An ideal text or reference work for students and researchers in material science, who need to learn the basics of thin films.

Thin Film Materials Technology

Sputtering of Compound Materials
Author: Kiyotaka Wasa,Makoto Kitabatake,Hideaki Adachi
Publisher: William Andrew
ISBN: 0815519311
Category: Technology & Engineering
Page: 532
View: 5083
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An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.

Understanding Surface and Thin Film Science


Author: Thomas M. Christensen
Publisher: CRC Press
ISBN: 9781482233032
Category: Science
Page: 300
View: 9210
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This book offers a clear and experiment-driven introduction to the materials science of surfaces and thin films. It includes only simple mathematics and numerous illustrations to help develop an intuitive understanding of how atomic level processes relate to macroscopic variables such as temperature, deposition rate, and energies. The book starts by addressing properties of clean surfaces and surfaces with adsorbed atoms on them, and advances to discussion of the coalescence, growth, and thickening of thin solid films for various applications.

Materials Science in Microelectronics II

The Effects of Structure on Properties in Thin Films
Author: Eugene Machlin
Publisher: Elsevier
ISBN: 9780080460406
Category: Technology & Engineering
Page: 228
View: 8999
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The subject matter of thin-films – which play a key role in microelectronics – divides naturally into two headings: the processing / structure relationship, and the structure / properties relationship. Part II of 'Materials Science in Microelectronics' focuses on the latter of these relationships, examining the effect of structure on the following: • Electrical properties • Magnetic properties • Optical properties • Mechanical properties • Mass transport properties • Interface and junction properties • Defects and properties Captures the importance of thin films to microelectronic development Examines the cause / effect relationship of structure on thin film properties

Principles of Vapor Deposition of Thin Films


Author: Professor K.S. K.S Sree Harsha
Publisher: Elsevier
ISBN: 9780080480312
Category: Technology & Engineering
Page: 1176
View: 4668
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The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Handbook of Thin Film Deposition

Techniques, Processes, and Technologies
Author: Krishna Seshan
Publisher: William Andrew
ISBN: 1437778739
Category: Technology & Engineering
Page: 392
View: 1792
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Resumen: The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Nanostructured Thin Films and Nanodispersion Strengthened Coatings


Author: Andrey A. Voevodin,Dmitry V. Shtansky,Evgeny A. Levashov,John J. Moore
Publisher: Springer Science & Business Media
ISBN: 1402022220
Category: Technology & Engineering
Page: 322
View: 2751
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This volume contains proceedings of the NATO-Russia Advanced Research Workshop on Nanostructured Thin Films and Nanodispersion Strengthened Coatings (December, 2003, Moscow). During this Workshop leading researchers from twelve countries had presented and discussed most recent developments in the fields of plasma physics and surface engineering related to the preparation and applications of nanostructured thin films and nanodispersion strengthened coatings. These presentations are encompassed in 31 individual chapters. The chapters are assembled in five parts in according to the workshop sessions. Part I is a compilation of chapters on hard and tribological coatings. The recent advances in this area are significant in that it is now possible to engineer strong, hard, and tough coatings that can operate at temperatures higher than 1200 ?C and exhibit ‘smart’, adaptive characteristics. These coatings are based on an amorphous matrix, e. g. nitrides, carbides, borides, or carbon, in which there is a controlled nucleation and growth of ultra hard nanoparticles of crystalline carbides, nitrides, borides and oxides. The critical feature is the control of both the particle size, i. e. , less than 10 nm, and interpartical spacing of a few nanometers. The ‘smart’ or adaptive characteristic is engineered into the nanostructures using similar sized (less than 10 nm) particles of metallic chalcogenidese, ductile metals, or glass forming elements to provide high lubricity and chemical adaptation at the environment change, e. g. , high and low humidities and temperatures.

Encyclopedia of Materials Characterization

Surfaces, Interfaces, Thin Films
Author: C. R. Brundle,Charles A. Evans,Shaun Wilson
Publisher: Gulf Professional Publishing
ISBN: 9780750691680
Category: Technology & Engineering
Page: 751
View: 4629
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Encyclopedia of Materials Characterization is a comprehensive volume on analytical techniques used in materials science for the characterization of surfaces, interfaces and thin films. This flagship volume in the Materials Characterization Series is a unique, stand-alone reference for materials science practitioners, process engineers, students and anyone with a need to know about the capabilities available in materials analysis. An encyclopedia of 50 concise articles, this book will also be a practical companion to the forthcoming books in the Series. It describes widely-ranging techniques in a jargon-free manner and includes summary pages for each technique to supply a quick survey of its capabilities.

Halbleiterphysik

Eine Einführung:
Author: Karlheinz Seeger
Publisher: Springer-Verlag
ISBN: 3322985539
Category: Technology & Engineering
Page: 652
View: 6826
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Handbook of Thin Film Deposition Processes and Techniques


Author: Krishna Seshan
Publisher: William Andrew
ISBN: 0815517785
Category: Technology & Engineering
Page: 430
View: 822
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New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques. Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Deposition and Processing


Author: N.A
Publisher: Academic Press
ISBN: 0125129084
Category:
Page: N.A
View: 4017
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Ceramic Materials

Science and Engineering
Author: C. Barry Carter,M. Grant Norton
Publisher: Springer Science & Business Media
ISBN: 0387462716
Category: Technology & Engineering
Page: 716
View: 3348
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Ceramic Materials: Science and Engineering is an up-to-date treatment of ceramic science, engineering, and applications in a single, integrated text. Building on a foundation of crystal structures, phase equilibria, defects and the mechanical properties of ceramic materials, students are shown how these materials are processed for a broad diversity of applications in today's society. Concepts such as how and why ions move, how ceramics interact with light and magnetic fields, and how they respond to temperature changes are discussed in the context of their applications. References to the art and history of ceramics are included throughout the text. The text concludes with discussions of ceramics in biology and medicine, ceramics as gemstones and the role of ceramics in the interplay between industry and the environment. Extensively illustrated, the text also includes questions for the student and recommendations for additional reading. KEY FEATURES: Combines the treatment of bioceramics, furnaces, glass, optics, pores, gemstones, and point defects in a single text Provides abundant examples and illustrations relating theory to practical applications Suitable for advanced undergraduate and graduate teaching and as a reference for researchers in materials science Written by established and successful teachers and authors with experience in both research and industry

Micro- and Opto-Electronic Materials and Structures: Physics, Mechanics, Design, Reliability, Packaging

Volume I Materials Physics - Materials Mechanics. Volume II Physical Design - Reliability and Packaging
Author: Ephraim Suhir,Y.C. Lee,C.P. Wong
Publisher: Springer Science & Business Media
ISBN: 0387329897
Category: Technology & Engineering
Page: 1460
View: 5808
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This handbook provides the most comprehensive, up-to-date and easy-to-apply information on the physics, mechanics, reliability and packaging of micro- and opto-electronic materials. It details their assemblies, structures and systems, and each chapter contains a summary of the state-of-the-art in a particular field. The book provides practical recommendations on how to apply current knowledge and technology to design and manufacture. It further describes how to operate a viable, reliable and cost-effective electronic component or photonic device, and how to make such a device into a successful commercial product.